Paper Title
Fabrication of Low Cost Atomic Layer Deposition System For The Preparation Of Ultrathin ZnO Films for Optoelectronic Applications

Abstract
A low cost atomic layer deposition system was designed and fabricated for the deposition of Ultra thin Zinc oxide films. Diethyl Zinc and Deionized water were used as Zinc and Oxygen precursors respectively and high purity Argon gas as purging gas. Ultra thin layer of ZnO was prepared on glass substrates. The deposited thin films were investigated for structural, optical and morphological studies using Glancing angle X-ray diffraction (GAXRD), Spectroscopic ellipsometer, UV–VIS spectrometer, Scanning electron microscope etc Index terms: Atomic layer deposition, System Fabrication, Ultrathin ZnO film, GAXRD